הטכניון מכון טכנולוגי לישראלXyz
הטכניון מכון טכנולוגי לישראל - בית הספר ללימודי מוסמכים 
Ph.D and MS.c Theses, since 1988.


Advisor Professor Emeritus Eizenberg Moshe
Advisor's Email eizen@technion.ac.il
Advisor's Home-Site www
No of theses 32
Department Materials Science and Engineering
Department Web Site www.technion.ac.il/technion/materials


No.   Student's Name Graduation
Year
Degree Abstracts Research Name
 1 Nethanel Fraenkel 2018 MSc Abstracts Structural and Electrical Characterization of Cobalt Thin Films for Usage as Gate Metal in Advanced MOS Devices
 2 Igor Krylov 2017 PhD Abstracts Nano-Scale Atomic Layer Deposited Dielectrics for InGaAs Metal-Insulator-Semiconductor Field-Effect- Transistors
 3 Pinhas Shekhter 2017 PhD Abstracts Electrical and Dielectric Properties of Rare-Earth Oxides as High K Insulators
 4 Roy Winter 2017 PhD Abstracts The Role of Interfaces and Defects in Controlling the Properties of InGaAs MOS Devices
 5 Avi Shriki 2017 MSc Abstracts A Study of Ohmic Contacts to Gallium Nitride-Based High Electron Mobility Transistors(HEMTs)
 6 Yael Rodes 2016 MSc Abstracts Investigation and Optimization of MIM Silicon Nitride Capacitors Embedded in Cu BEOL Technology
 7 Shlomo Mehari 2016 PhD Abstracts A Study of Gate Leakage Current and Electron Trapping Effects in AlGaN/GaN-Based Heterostructure Field Effect Transistors
 8 Oren Zonensain 2016 MSc Abstracts Characterization and tuning of the effective work function of WCxNy films for advanced MOS device applications
 9 Sivan Fadida Gliksman 2016 PhD Abstracts The Role of Interfaces and Defects in Controlling the Properties of Ge Based MOS Devices
 10 Lior Kornblum 2012 PhD Abstracts The Role of the Metal/Dielectric Interface Properties in Determining the Electrical Behavior of Si MOS Devices
 11 Irena Geppert 2011 PhD Abstracts Characterization of High-k Materials and their Interface with Si and Metal
 12 Jonathan Avner Rothschild 2011 PhD Abstracts The Effect of Alloying on the Effective Work Function at Metal/High-K Dielectric Interfaces
 13 Eran Lipp 2009 PhD Abstracts Investigation of the Properties of Metal/High-K (Gd2O3) Interfaces for Advanced MOS Devices
 14 Hagay Marom 2007 PhD Abstracts Investigation of the Electrical Conductivity of Copper in Nanometric Dimensions for Application as Interconnects in Integrated Circuits
 15 Ilanit Fisher 2005 PhD Abstracts Study of Porous SiO2-Based Films as Low-k Dielectrics and Their Integration with Copper Metallization
 16 Eran Lipp 2004 MSc Abstracts The Effect of Cu on the Electrical Properties of MOS Capacitors
 17 Shay Joseph 2003 MSc Abstracts TiSiN Films Produced by CVD as Diffusion Barriers for Cu Metallization
 18 Amit Kohn 2003 PhD Abstracts Investigation of Electrochemically Deposited Thin Films for Application as Diffusion Barriers in Copper Metallization
 19 Yohai Roichman 2000 MSc
Cobalt-Silicide Contacts on Si1-Ycy Layers Epitaxially Grown on Si(001)
 20 Nava Ariel 2000 MSc
Fluorinated Amorphous Carbon as Low-K Dielectric Material And Its Interface with Copper Metallization
 21 Michal Avinun 1999 MSc
Nucleation and Growth of Cvd Al on Different Types of Ti/tin
 22 Michael Bergovsky 1999 PhD
Phase Formation in the Ti/Si-Ge System
 23 Alon Eyal 1998 PhD
Ti Metallization of Sigec Epitaxial Layers Grown on Si (001)
 24 Inga Winer 1997 MSc
Nucleation and Growth of Cvd W
 25 Yitzhak Eric Greenbaum 1995 MSc
Formation of Titanium Silicide on Ion Implanted Silicon
 26 Rami Saad 1995 MSc
Properties of Tungsten Silicide Layers
 27 Alexander Buxbaum 1994 PhD
Structural and Electrical Properties of Thin Palladium Layers on Epitaxial Si1-Xgex/si
 28 Ziv Atzmon 1993 PhD
Solid Phase Epitayial Growth and Electrical
 29 Shoshana Tamir 1993 PhD
Laser Induced Silicon Deposition from Gas Phase
 30 Ephraim Koltin 1991 MSc
Metallization of Cobalt and Germanium Thin Filas on Gaas
 31 Mira Ben-Tzur 1989 PhD
Solid State Reactions Between Thin Films of Al/ti-Ta and
 32 Menachem Genut 1988 PhD